Texture formation in chemical vapor deposition of Ti(C,N)

L. von Fieandt,T. Larsson,M. Boman, E. Lindahl

Journal of Crystal Growth（2019）

引用 11|浏览13

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摘要

•Reaction order is close to 1 with regards to CH3CN.•Reaction order is close to 0 with regards to TiCl4.•Coating composition unaffected by precursor partial pressure.•Texture forming mechanism for 〈2 1 1〉 growth.

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关键词

A1. Growth model,B1. Titanium compounds,A3. Chemical vapor deposition process,A1. X-ray diffraction

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