Electrical Characterization Of Ald Hfo2 High-K Dielectrics On ((2)Over-Bar01) Beta-Ga2o3
APPLIED PHYSICS LETTERS(2018)
摘要
The electrical quality of HfO2 dielectrics grown by thermal atomic layer deposition at 175 degrees C on n-type ((2) over bar 01) beta-Ga2O3 has been studied through capacitance-and current-voltage measurements on metal-oxide-semiconductor capacitors. These capacitors exhibited excellent electrical characteristics, including dual-sweep capacitance-voltage curves with low hysteresis and stretch-out and a frequency-stable dielectric constant of k similar to 14 when measured between 10 kHz and 1MHz. The C-V curves exhibited a uniform and repeatable + 1.05V shift relative to the ideal case when swept from 3.5 to -5V, yielding positively measured flatband (+2.15 V) and threshold (+1.05 V) voltages that may be useful for normally off n-channel Ga2O3 devices. Using the Terman method, an average interface trap density of 1.3 x 10(11) cm(-2).eV(-1) was obtained between 0.2 and 0.6 eV below the conduction band edge. The forward bias current-voltage characteristic was successfully fitted to the Fowler-Nordheim tunneling model at a field strength of 5MV/cm, allowing an extraction of a 1.3 eV conduction band offset between HfO2 and Ga2O3, which matches the value previously determined from x-ray photoelectron spectroscopy. However, a temperature dependence in the leakage current was observed. These results suggest that HfO2 is an appealing dielectric for Ga2O3 device applications. Published by AIP Publishing.
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