Erratum: “Epitaxial growth and electrical properties of VO2 on [LaAlO3]0.3[Sr2AlTaO6]0.7 (111) substrate” [J. Vac. Sci. Technol. A 36, 061506 (2018)]Yang Liu,Shanyuan Niu,Thomas Orvis,Haimeng Zhang,Huan Zhao,Han Wang,Jayakanth RavichandranJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A(2019)引用 0|浏览14暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络