Low temperature HFCVD synthesis of tungsten oxide thin film for high response hydrogen gas sensor application
MATERIALS LETTERS, pp. 398.0-401.0, 2019.
A quick and efficient approach was employed for the growth of nanocrystalline tungsten oxide (WO3) thin films using one-step hot filament chemical vapor deposition (HFCVD) method at low temperature. In a typical experiment, the parent material tungsten (W) was subjected to oxidation, gasification and its subsequent condensation to obtain ...More
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