Low temperature HFCVD synthesis of tungsten oxide thin film for high response hydrogen gas sensor application

Rhushikesh Godbole
Rhushikesh Godbole
Umesh T. Nakate
Umesh T. Nakate

MATERIALS LETTERS, pp. 398.0-401.0, 2019.

Cited by: 0|Bibtex|Views1|DOI:https://doi.org/10.1016/j.matlet.2019.07.110
Other Links: academic.microsoft.com

Abstract:

A quick and efficient approach was employed for the growth of nanocrystalline tungsten oxide (WO3) thin films using one-step hot filament chemical vapor deposition (HFCVD) method at low temperature. In a typical experiment, the parent material tungsten (W) was subjected to oxidation, gasification and its subsequent condensation to obtain ...More

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