First Demonstration of Complementary FinFETs and Tunneling FinFETs Co-Integrated on a 200 mm GeSnOI Substrate: A Pathway towards Future Hybrid Nano-electronics Systems

For the first time, complementary FinFETs and complementary tunneling FinFETs (TFFETs), with fin width (WFin) of 20 nm and fin height (Hfin) of 50 nm, were co-integrated on the same substrate, enabled by the formation of high-quality GeSn-on-insulator (GeSnOI) substrate with 200 mm wafer size. Decent electrical characteristics were realized for both GeSn n-and p-channel FinFETs and TFFETs. We also performed simulation studies to show the promise of the GeSnOI platform, which is not only able to suppress the off-state leakage current and improve the Ion/Ioff ratio of tunneling FETs, but can also provide the powerful flexibility of using a back bias to achieve superior electrical characteristics beyond the benefits of incorporating Sn into Ge.