Cross sectional complex structure analysis is a key issue of thin film research: A case study on the preferential orientation crossover in TiN thin films
Thin Solid Films(2019)
摘要
Published results of the multitudinous experiments studying the relationships between the properties and process parameters of sputter deposited TiN films indicate a very complex problem. The complexity manifests itself preferentially in the sporadic formation of the <100> and <111> preferred orientation (PO) and in the sequential formation (crossover) of the <100> and <111> PO in thicker films, even when the deposition parameters are maintained constant during the deposition. The first problem has been clarified by dedicated experiments as well as theoretical works. These revealed that the selection between the development of the <100> and <111> PO is related to the condition of the impinging species, i.e. whether they are neutral or ionized, molecular or atomic Ti and N species, to the degree of ionization, to the ratio of the impinging rates of these species and to their energy as well. Understanding the cross-over formation between the <100> and <111> PO remained, however, an open question so far. As the driving force for this process, the operation of the proposed overall energy minimisation effect, the interplay of the surface and interface and the inner stress energy during thickness growth of the film has been queried.
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关键词
Titanium nitride,Thin films,Preferred orientation,Preferred orientation cross-over,Oxygen impurity effect,Complex structural characterization,Microchemistry
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