High-aspect ultra-thin Ga 2 O 3 nanowall structures with 7nm-width fabricated by Hydrogen environment anisotropic thermal etching of (010) β-Ga 2 O 3Yuuki Ooe,Yusei Kawasaki,Daichi Ito,Yuta Moriya, Kouki Abe,Kentaro Kinoshita,Rie Togashi,Akihiko KikuchiThe Japan Society of Applied Physics（2019）引用 23|浏览3暂无评分AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
