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Pre-Epitaxial Plasma Etch Treatment for the Selective Epitaxial Growth of Silicon in High Aspect Ratio 3D NAND Memory

Cheng-Yi Lung

Yao-An Chung

Ming-Tsung Wu

Hong-Ji Lee

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Kuang-Chao Chen

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advanced semiconductor manufacturing conference, 2019.

Cited by: 0|Bibtex|Views15|DOI:https://doi.org/10.1109/ASMC.2019.8791765

Other Links: academic.microsoft.com

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