Study of Plasma Arcing Mechanism in High Aspect Ratio Slit Trench EtchingMarkYao-An ChungCheng-Yi LungYuan-Chieh ChiuHong-Ji LeeNan-Tzu Lian[0]Tahone Yang[0]Kuang-Chao Chen[0]Chih-Yuan Lu[0]advanced semiconductor manufacturing conference, 2019.Cited by: 0|Bibtex|Views15|DOI:https://doi.org/10.1109/ASMC.2019.8791770Other Links: academic.microsoft.comCode: Data: Full Text (Upload PDF)PPT (Upload PPT)Upload PDFUpload PPTYour rating :0 TagsCommentsSubmit
