Study of Si-ion-implantation Process on High-purity HVPE-AlN Substrates to Form n-type Region Yudai Shimizu,Daichi Saito,Nao Takekawa,Ken Goto,Toru Nagashima, Reo Yamamoto,Bo Monemar,Yoshinao KumagaiThe Japan Society of Applied Physics(2019)引用 23|浏览11暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络