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Ion Implantation and Electrical Annealing for Trimming Silicon MZIs and Facilitating One-Time Programmable Photonic Circuits

International Conference on Group IV Photonics(2019)

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Abstract
We use Ge ion implantation and electrical annealing, via TiN micro-heater, to trim silicon MZIs. The results show the possibility for switching the output power from the drop port to through port permanently, locally and rapidly.
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Key words
Ion implantation,Switching,Electrical Annealing,Mach-Zehnder Interferometer,silicon photonics
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