Investigation of Source Starvation in High-Transconductance III–V Quantum-Well MOSFETs
IEEE Transactions on Electron Devices(2019)
摘要
In this article, a detailed simulation study of high-performance InGaAs quantum-well (QW) MOSFETs is presented. We demonstrate that the limited free carrier density in the access region leads to a significant source starvation effect in the saturation regime, which limits the maximum transconductance (
${g}_{m}$
). By coupling ballistic 2-D quantum mechanical simulations with an original semiclassical model for source starvation, we are able to reproduce quantitatively the
${V}_{\text {GS}}$
–
${g}_{m}$
characteristics of three successive device generations differing only in the design of their access region. Source starvation is approximated as a quasi-equilibrium phenomenon characterized by a nonlinear, current-dependent voltage drop in the access region that reduces injection into the channel at high currents. Even in the most recent record device with a
${g}_{m}$
peak of 3.45 mS/
$\mu \text{m}$
, source starvation is found to have a negative impact. An extrapolation of our model furthermore suggests that source starvation will become a major performance bottleneck in future device realizations with lower trap densities.
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关键词
Access region,III–V,interface traps,quantum transport (QT),quantum-well (QW) MOSFET,quasi-equilibrium,source starvation,transconductance
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