Photo-Patternable Quantum Dots/Siloxane Composite with Long-Term Stability for Quantum Dot Color-Filters.

Incorporation of quantum dots (QDs) into color-filters (CFs) are desired for less energy loss and wider viewing angle compared to conventional display. However, aggregation and vulnerability to heat, moisture, and chemicals in photo-patternable matrix are critical issues of the QD-CFs with high QDs concentration. Herein, we fabricated red (10 wt%) and green (20 wt%) QD-CFs using photolithography of QD/siloxane ink containing secondary thiol monomer. Ligand exchanged QDs were chemically incorporated in methacrylate oligo-siloxane resin. QD/siloxane composite showed superior stability against heat and moisture (85 ℃/5% RH and 85 ℃/85% RH) and chemicals (EtOH, HCl and NaOH) compared to conventional QD/PR (commercial negative photoresist). 10 μm-thick QD-CFs effectively converted blue light to red and green light, and the obtained white PL through QD-CF exhibited a wider color gamut (108% in CIE 1931) compared to NTSC. From these advantages, QD/siloxane composite will be beneficial as color-conversion photoresist to be used as color-filters in LCDs, μLEDs, and OLEDs.