Total-Ionizing-Dose Effects and Low-Frequency Noise in 16-nm InGaAs FinFETs With HfO 2 /Al 2 O 3 Dielectrics

Total-ionizing-dose mechanisms are investigated in 16-nm InGaAs FinFETs with an HfO2/Al2O3 gate-stack. Transistors are irradiated up to 500 krad(SiO2) and annealed at high temperatures. Irradiated devices show negative threshold-voltage Vth shifts, subthreshold stretch-out, and leakage current increases. These result from positive charge trapping in the gate oxide and shallow trench insulators, an...