Effect of the period of the substrate oscillation in the dynamic glancing angle deposition technique: A columnar periodic nanostructure formation

Nanostructured CrN thin films are obtained by combining RF physical vapor and dynamic glancing angle deposition using a computer-controlled substrate oscillatory motion. By using an appropriate frequency for substrate oscillation, it becomes feasible to tailor the physical properties of thin films deposited onto the substrate. The films are deposited by moving the substrate back and forward between specified angles with, among other parameters, a controlled time-dependent angular position φ(t) of the substrate. Thus, the direction of atoms striking the film changes in accordance to the position of the substrate.