Influence of sputtering conditions on the properties of aluminum-doped zinc oxide thin film fabricated using a facing target sputtering system
Thin Solid Films（2020）
摘要
•Al-doped ZnO films deposited under various input power and thickness conditions.•Input current affects the electrical and crystallographic properties.•200 nm thick film deposited with 100 W input power has the best properties.
更多查看译文
关键词
Aluminum-doped zinc oxide,Transparent conductivity oxide,Thin film,Facing target sputtering system
AI 理解论文
溯源树
样例
生成溯源树，研究论文发展脉络
Chat Paper
正在生成论文摘要