Wet-chemical etching of FIB lift-out TEM lamellae for damage-free analysis of 3-D nanostructures
Ultramicroscopy, pp. 1130492020.
Reducing ion beam damage from the focused ion beam (FIB) during fabrication of cross sections is a well-known challenge for materials characterization, especially cross sectional characterization of nanostructures. To address this, a new method has been developed for cross section fabrication enabling high resolution transmission electron...More
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