First principles study of the atomic layer deposition of alumina by TMA-H 2 O-process Year : 2015 Version : Post print

Rights: © 2015 Royal Society of Chemistry. This is the post print version of the following article: Weckman, Timo & Laasonen, Kari. 2015. First principles study of the atomic layer deposition of alumina by TMA-H2O-process. Physical Chemistry Chemical Physics. Issue 17. 17322-17334. DOI: 10.1039/C5CP01912E, which has been published in final form at http://pubs.rsc.org/en/Content/ArticleLanding/2015/CP/C5CP01912E#!divAbstract.