Deposition Condition at Low Temperature for Crystallization Enhancement of YSZ Films on Glass Substrates by Reactive Sputtering

Previously, it has been reported that yttria stabilized zirconia (YSZ) film is quite effective to stimulate crystallization of amorphous Silicon (a-Si) and obtain poly-Si at low temperature. Because of small lattice mismatch of YSZ with Si, it is expected that obtained poly-Si film will have high crystallinity owing to the crystallographic information of YSZ film. Further, obtaining high crystallization of Si at lower temperatures can facilitate fabrication of poly-TFTs at lower temperature on biodegradable paper substrates susceptible to heat damages like cellulose nanopaper (CNP). Therefore, we report the investigation of deposition conditions to obtain poly-crystalline YSZ film at low temperature through method of reactive sputtering.