Design Of Thin-Film Interlayer Between Silicon Electrode And Current Collector Using A Chemo-Mechanical Degradation Model
JOURNAL OF THE ELECTROCHEMICAL SOCIETY(2020)
摘要
To enhance delamination limitations in silicon electrode, a thin-film interlayer between silicon electrode and copper current collector is designed using a chemo-mechanical degradation model. The chemo-mechanical degradation model considers the formation of the solid electrolyte interphase on the surface and within the cracks of the silicon electrode, the physical isolation of active materials and the resistance due to loss of contact between the silicon composite electrode and the copper foil as the main capacity fading mechanisms. The model is validated with experimental data collected from coin cells made of silicon electrode with a bare and an adhesive thin film laminated copper foil. The reduction in the delamination limitations depends on the interplay of the adhesion strength, conductivity, coverage and thickness of adhesive thin film on the surface of the copper foil. (C) 2020 The Electrochemical Society ("ECS"). Published on behalf of ECS by IOP Publishing Limited.
更多查看译文
关键词
Silicon anode, Capacity fade model, Thin film interlayer, Delamination, Lithium ion batteries
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络