WVTR of Al 2 O 3 film deposited at room temperature using Pure-Ozone-ALD process with TMA Ayaka Abe,Takayuki Hagiwara,Naoto Kameda,Toshinori Miura,Yoshiki Morikawa,Mitsuru Kekura,Ken Nakamura,Hidehiko NonakaThe Japan Society of Applied Physics(2020)引用 0|浏览8暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要