Endurance property of low-temperature (300 °C)-fabricated ferroelectric Hf x Zr 1 −x O 2 thin films using plasma-enhanced atomic layer depositionTakashi Onaya,Toshihide Nabatame, Yongchan Jung, Hernandez-Arriaga Heber,Jaidah Mohan, Harrison S. Kim, Ava Khosravi,Naomi Sawamoto, Takahiro Nagata, Robert M. Wallace,Jiyoung Kim,Atsushi OguraThe Japan Society of Applied Physics（2020）引用 0|浏览0暂无评分AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
