Improvement of ferroelectricity of thick ferroelectric films using Hf x Zr 1−x O 2 /ZrO 2 stack structureTakashi Onaya,Toshihide Nabatame,Mari Inoue, Yong Chan Jung,Heber Hernandez-Arriaga,Jaidah Mohan, Harrison S. Kim,Naomi Sawamoto, Takahiro Nagata,Jiyoung Kim,Atsushi OguraThe Japan Society of Applied Physics(2020)引用 0|浏览1暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要