Effect Of Hafnium Addition On Structure, Wear Resistance And High Temperature Oxidation Of Mosx Thin Films

Pure MoSx and MoSx + Hf thin films were deposited by magnetron sputtering and characterized by RBS, GAXRD, XPS, high temperature oxidation tests and tribological tests. Hf content was set at 12 at.% by RBS and GAXRD analyses revealed a complete amorphization caused by Hf incorporation. XPS analyses indicated that hafnium is inserted in MoSx in the form of HfSx, moreover, such compound was responsible for inhibiting the formation of MoS. These factors are closely correlated with improvements obtained in oxidation resistance, friction coefficient, wear rate and lifespan of MoSx thin films.