Effects Of Titanium Target Power On The Characteristics Of Ti-Mos2 Coatings Deposited Using Pulsed Magnetron Sputtering


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In this study, we synthesized a composite coating, which the mixing of Ti into the MoS2 structure (MoST) by pulsed magnetron sputtering process in an argon atmosphere using Ti and MoS2 targets. Experimental results indicate that the Ti was incorporated in MoS2 structure and effectively enhanced the density and mechanical strength of the MoST coating. The mechanical properties of the MoST coating were strongly dependent on the Ti content. An increased Ti content due to the raised target power leads to enhance the hardness and wear life but degrade the surface roughness and friction coefficient. Furthermore, the optical emission spectra of the discharge showing that the Ti and Ar species increased greatly with the Ti target power which indicating more ionization of the metal and gas species in pulsed magnetron sputtering process than that in direct-current magnetron sputtering (dcMS) process. It was found that a higher Ti target power leads an increased plasma density and Ti content which results to a better compact structure of MoST coating.
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Key words
Ti-MoS2, Pulsed Magnetron Sputtering, Target power
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