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排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
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Nitride etching with hydrofluorocarbons III: Comparison of C4H9F and CH3F for low-k′ nitride spacer etch processes

Hiroyuki Miyazoe,Nathan Marchack,Robert L. Bruce,Yu Zhu,Masahiro Nakamura,Eric Miller,Sivananda Kanakasabapathy,Takefumi Suzuki, Azumi Ito,Hirokazu Matsumoto,Sebastian U. Engelmann,Eric A. Joseph

Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena（2018）

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