Cl2/Ar based atomic layer etching of AlGaN layersSébastien Aroulanda,Olivier Patard,Philippe Altuntas,Nicolas Michel,Jorge Pereira,Cédric Lacam,Piero Gamarra,Sylvain L. Delage,Nicolas Defrance,Jean-Claude de Jaeger,Christophe GaquièreJournal of Vacuum Science & Technology A(2019)引用 5|浏览6暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要