Investigation of monolayer and submonolayer films using X-ray photoelectron spectroscopy

V P Afanas’ev, D N Selyakov,O Yu Ridzel, M A Semenov-Shefov, A N Strukov

Journal of Physics: Conference Series(2020)

引用 0|浏览0
暂无评分
摘要
Abstract A method of layer thickness determination by X-ray photoelectron spectroscopy (XPS) is analyzed. Angle-resolved XPS spectra measured for three samples (gold films of different thicknesses located on top of silicon substrates) have been interpreted by the straight line approximation (SLA) model. Two configurations of films were considered: (i) a flat surface of a semi-infinite layer (substrate) is covered with a flat homogeneous layer, (ii) coating constitutes an island (cluster) structure. It is shown that the simplest model of an island coating makes it possible to qualitatively explain the effect of decreasing of the effective average coating thickness observed in the angle-resolved XPS experiments.
更多
查看译文
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要