Photon Flux Density Dependence of Nanographene Synthesis by Soft X-ray Irradiation from Pentacene-based Molecules Prepared on Ni Films by Hot Mesh Deposition

2022 29th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)(2022)

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摘要
To synthesize nanographene, a mixture film consisting of pentacene, 6,13-dihydropentacene, and pentacene oligomers, prepared by hot mesh deposition, were irradiated with soft X-rays in NewSUBARU. The dependence of photon flux density on nanographene synthesis was evaluated to control the size of nanographene and to clarify the polymerization mechanism. It was found that the high photon flux density is required to synthesis nanographene. It was suggested that the supply of excited electrons from Ni under layer affects the orientation of nanographene.
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关键词
polymerization,nanographene orientation,excited electrons,nanographene size,NewSUBARU,pentacene-based molecules,photon flux density,pentacene oligomers,6,13-dihydropentacene,mixture film,hot mesh deposition,nickel films,soft X-ray irradiation,nanographene synthesis,Ni,C
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