Synthesis features and structural characterization of carbon nanowalls prepared from organoboron compounds

The work presents data on the practical relevance of carbon nanowalls, methods of their deposition, particularly plasma-enhanced ones, and the mechanisms of their formation to demonstrate the specific character of the deposition from organoboron precursors. A procedure for the preparation of plate-like carbon sheets in the form of vertically aligned carbon nanowalls on Si(100) substrates is developed and implemented. The procedure includes a stage of plasma-enhanced deposition from vapors of organoboron compounds at 600-800 °C and subsequent annealing at 900 °C. Trimethylborate, triethylborate, and triisopropylborate are used for the first time to produce carbon nanowalls. It is studied how the composition and structure of carbon nanowalls prepared on Si(100) substrates depend on the origin of the initial organoboron compound and the synthesis temperature. The obtained carbon nanowalls consist of small crystallites but exhibit high degree of graphitization and phase purity. A mechanism of carbon nanowall nucleation and growth is proposed and discussed.