Porous-structure Engineered Spacer for High-Throughput and Rapid Growth of High-Quality Graphene Films

Chemical vapor deposition (CVD) in conjunction with batch-to-batch manufacturing process is considered as the most promising technical route for mass-production of high-quality graphene films. To improve the space utilization of the CVD chamber and increase the throughput per batch, stacking of the Cu foil substrates is efficient, but suffers from the problems of adjacent fusion and the poor mass-transfer. Here, we demonstrate an efficient strategy for high-throughput and rapid growth of high-quality graphene by alternate stacking of Cu foils and porous carbon fiber paper (CFP). Relying on the unhindered mass-transfer through the pores of CFPs, full-covered high-quality graphene films on compact-stacked Cu foils were achieved within 2 min. Computational fluid dynamics (CFD) simulation and isotope labeling technique were performed to explore the gas diffusion and graphene growth process in the confined space of the Cu-CFP stacks. This work provides a feasible method for industrial production of graphene films, which may also be used for batch production of other two-dimensional materials.