Chloride-assisted Synthesis of Tellurene Directly on SiO2/Si Substrates: Growth Mechanism, Thermal Properties, and Device Applications

Yi-Hsun Chan,Che-Yi Lin,Yu-Chang Chou,Alice Chinghsuan Chang,Yen-Fu Lin,Yu-Ze Chen

MATERIALS ADVANCES（2023）

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摘要

The tellurene flakes display outstanding structure stability over 30 days under ambient exposure and reveal the abnormal thermal conductance across grain boundary by exploiting SThM.

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Stability

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