Post-thermal annealed monolayer graphene healing elucidated by Raman spectroscopy

The inconsistent conductivity and surface roughness of commercially available chemical vapour deposition (CVD) monolayer graphene films have limited their widespread adoption in optoelectronic devices. This study presents a novel approach to address this issue by investigating the effect of post-thermal annealing on the sheet resistance (Rs) and surface properties of CVD monolayer graphene films on quartz substrates. The films undergo thermal annealing at temperatures ranging from 200 to 600 ^∘C in a nitrogen environment using a one-zone tube furnace. Remarkably, annealing the graphene films at 400 ^∘C leads to a remarkable reduction in Rs by 58.1