Rational Chemical Design of Molecular Glue Degraders (vol 9, pg 915, 2023)
Ethan S. Toriki,James W. Papatzimas, Kaila Nishikawa,Dustin Dovala,Andreas O. Frank,Matthew J. Hesse, Daniela Dankova, Jae-Geun Song, Megan Bruce-Smythe, Heidi Struble,Francisco J. Garcia,Scott M. Brittain, Andrew C. Kile,Lynn M. McGregor, Jeffrey M. McKenna,John A. Tallarico,Markus Schirle,Daniel K. Nomura ACS CENTRAL SCIENCE（2023）
AI 理解论文
溯源树
样例
