A new route to apply nanometric alumina coating on powders by fluidized bed chemical vapor deposition

•Development of a new route to deposit Al2O3 films on powders by fluidized bed CVD.•Use of the single source aluminum tri-isopropoxide precursor between 400 and 500 °C.•Demonstration of a stable and reproducible behavior of the coating process.•Obtaining of continuous and conformal nanometric coatings of stoichiometric alumina.•Possibility to conformally coat a wide range of oxygen sensitive powders.