New Insights into the Memory Window Estimation in FeFET from a Dynamic Perspective
2023 Silicon Nanoelectronics Workshop (SNW)(2023)
摘要
In this work, the impact of the dynamic process during the falling edge of program/erase (P/E) pulses and relaxation stage on the memory window (MW) of FeFET is investigated. With a new perspective, we observe non-trivial trends of MW with different values of remnant polarization
$(P_{\mathrm{r}})$
and relative permittivity
$(\varepsilon_{\mathrm{F}\mathrm{E}})$
, which differs from their monotonic effect on the coercive voltage
$(V_{\mathrm{c}})$
of the ferroelectric layer. Furthermore, simulation results show different
$V_{\mathrm{t}\mathrm{h}}$
values for varying fall times of P/E pulses, which have been verified through experimental observations. Our results offer a novel perspective for accurately evaluating the MW of FeFET and provide design strategies for device optimization.
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