Study on Precursor Distribution of a No-inner-wall Deposition Atmospheric Pressure Plasma Jet Used for Thin Film Deposition

Abstract An atmospheric pressure jet that effectively prevents inner wall deposition has been developed, and its precursor distribution and thin-film deposition characteristics have been studied. Through flow field simulation and particle tracing methods, it has been demonstrated that, under the protection of high-velocity discharge gas, the reactants will not diffuse to the inner wall of the plasma jet device, effectively preventing wall deposition. The pattern of the deposited film closely resembles the diffusion pattern of the precursor within the plasma jet apparatus. By investigating deposited films in different regions, the influence of precursor distribution on film morphology and composition has been studied. This plasma device offers a stable plasma plume for thin film deposition and nanoparticle preparation.