Evaluation of tin nitride (Sn₃N₄) via atomic layer deposition using novel volatile Sn precursors

Dalton Transactions（2023）

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摘要

Novel tin precursor with iminopyrrolidine moieties was synthesized and investigated for Sn 3 N 4 thin films via the ALD process.

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关键词

tin nitride,novel volatile sn<sub>3</sub>n<sub>4</sub> precursors,atomic layer deposition

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Evaluation of tin nitride (Sn3N4) via atomic layer deposition using novel volatile Sn precursors