Investigation of mesoporous silicon thermal conductivity: Effect of nanographene insertion

In this study, the impact of nanographene incorporation on the thermal properties of mesoporous silicon (PSi) was evaluated using two complementary experimental methods: the temperature gradient (TG) and the photothermal radiometry (MPTR) methods. It is shown that the measured thermal conductivity of the mesoporous silicon (PSi) ranges from 0.10 to 0.68 W/m.K in the case of TG and from 0.37 to 3.02 W/m.K in MPTR and is strongly correlated to the electrochemical etching parameters. These values are much lower than that of crystalline silicon, estimated to be from 100 to 140 W/m.K, depending on the doping rate. They appear to be, however, in the order of magnitude range for the percolation models that also include the in-depth porosity and the crystallite mean radius. This set of experiments on the thermal conductivity was extended to investigate the effect of graphene incorporation in the PSi matrix (G-PSi) as it has seldom been reported in the literature. The results from both methods exhibit significantly higher values (1.7 +/- 0.3 W/m.K for TG, and from 0.7 to 2.13 W/ m.K for MPTR). This spread of the thermal conductivity values is attributed to the intrinsic working principle of the TG versus the MPTR method as highlighted in the last part of the present paper. Targeting the thermoelectric application of both matrices (PSi, G-PSi), the thermal conductivity remains sufficiently low for them to be considered as very promising materials, keeping in mind the enhancement of the power-factor attributed to the incorporation of graphene.