Synthesis and Performance of TiN Film Electrode for Supercapacitor by a Facile Chemical Solution Deposition Method

Transition metal nitrides are recognized as an important electrode material for supercapacitors owing to their high corrosion resistance, good chemical and electrochemical stability, and electronic structure similar to transition metals. Here, we have successfully prepared the TiN thin films for supercapacitor electrodes without binder by means of a simple chemical solution deposition method. At a current density of 1 mA cm−2 in 0.5M H2SO4 electrolyte, the resulting TiN thin film electrode achieves a high volumetric capacitance of 205.1 F cm−3. In addition, a high energy density of 4.38 and 1.93 mWh cm−3 was achieved from the symmetric devices at a power density of 0.58 and 11.38 W cm−3, respectively. After 4000 cycles, an excellent retention of 85.3