Role of Mo thickness in growth of nanostructured MoO₃ and their optical sensing properties

The main objective of the present work is to investigate the role Mo thickness in growth of nanostructured MoO3 and their application for optical sensors like photodetectors. The devices were fabricated using standard scalable microfabrication techniques. MoO3 was synthesized by Mo thin film deposition using sputtering followed by dry oxidation at 550 degrees C. Further, these samples were tested as photodetectors for visible regions. The test results confirm that the devices are more sensitive towards 450 nm. The photodetector made on 80 nm Mo thickness exhibited a higher responsivity of 730 mA W-1, higher detectivity of 2.47 x 10(11) Jones, and higher photo to dark current ratio (PDCR) of 1.33 x 10(2) compared to other tested samples. Moreover, the optimized photodetector showed higher repeatability and a faster speed of 13/11 ms. These developed photodetectors could be vital for the visible light optical sensing era.