Improvement of high energy X-ray optical performance of W/Si supermirror by optimizing interface compounds using ultra-thin buffer layer

The high energy spectral properties of X-ray supermirrors are governed mainly by the interface diffusion and compound formation at the interfaces. Using ion beam sputtering technique, a set of W/Si periodic multilayers with C buffer layer (BL) and without C BL have been prepared and the effect of BL has been studied by grazing incidence specular X-ray reflectivity, diffused X-ray scattering and X-ray photoelectron spectroscopy. Using C BL at the W-on-Si interfaces, reduction of interface diffusion and minimization of WSix formation at the interfaces has been observed though signature of carbide formation has been noticed. Using the results an interface diffusion model has been proposed explaining the effect of C BL. Block method of X-ray supermirror design has been effectively used for reducing the number of layers of W/Si supermirror targeting the improvement of the performance. Finally, 36-layer W/Si supermirror with C BL and without C BL have been fabricated and the performance evaluated by reflectivity measurement using 25 keV synchrotron X-rays and cross sectional TEM measurements. This study has both technological implication in X-ray optical devices and also offers atomistic insight into the mechanism of improvement of the interface quality by application of ultra-thin buffer layer.