Accelerator development plan in KEK toward realization of High-power EUV-FEL for future lithography

Hiroshi Kawata,Norio Nakamura,Ryukou Kato,Hiroshi Sakai,Kimichika Tsuchiya,Yasunori Tanimoto,Yosuke Honda,Miho Shimada,Takanori Tanikawa,Olga A. Tanaka,Takashi Obina,Shinichiro Michizono

High-Brightness Sources and Light-Driven Interactions Congress（2024）

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摘要

The development of a high-power EUV light source is important to overcome the stochastic effects in future lithography. The EUV-FEL light source is one of the promising candidates. This paper proposes the accelerator development plan.

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