Abstract High-clarity and high-fidelity three-dimensional (3D) displays are widely regarded as the ultimate pursuit of display technology. For light-field displays (LFDs), these two visual metrics are respectively governed by the system's spatial and angular resolutions, which are fundamentally constrained by the intrinsic space-bandwidth product of two-dimensional (2D) display panels. The inherent trade-off between these two resolutions dictates that an improvement in angular resolution typically comes at the expense of spatial resolution, posing a long-standing challenge to the realization of high-performance 3D displays. To address this challenge, we propose a subpixel-demultiplexing viewpoint-interleaving encoding (SVE) method and a full-field dual-plane lens optimization (FDLO) approach to jointly realize a high spatial-angular resolution LFD. On the software algorithm end, the SVE method pre-encodes the input light-field images through two dedicated assignment strategies. This enables the multiplexed panel to yield an aliasing-free subpixel array of 4320(H) × 3840(V), along with an effective information density of 1612 subpixels per inch (SPI) horizontally and 806 SPI vertically. Furthermore, this method incorporates an odd–even viewpoint interleaving design in the vertical direction to enhance the parallax smoothness, thereby potentially improving visual comfort across the full field of view (FOV). On the optical hardware end, the FDLO approach simultaneously minimizes the spot sizes throughout the entire FOV at both the central depth plane and the viewing plane. This effectively suppresses voxel expansion and viewpoint spreading, achieving high spatial and angular resolutions. To verify the reliability of the proposed methods, a 5.5-inch LFD prototype was developed. Experimental results demonstrate that the prototype delivers high-clarity and high-fidelity 3D imaging with smooth motion parallax, achieving high spatial resolutions of 2.67 lp/mm (horizontal) and 2.99 lp/mm (vertical), alongside a high angular resolution of 1.45 viewpoint images per degree (VIPD).
Abstract High power laser processing is a cornerstone of modern manufacturing and advanced scientific research, where parallelization is critical for increasing throughput and enabling new capabilities. However, simultaneously achieving high power handling, multi-beam parallelization, and compact optical integration remains a long standing challenge. This trade-off is addressed by establishing a wafer scale silicon carbide (SiC) meta-optic platform that combines three key elements: the thermomechanical robustness of SiC, an aperture matched architecture for dense multi-beam integration, and a scalable semiconductor compatible manufacturing process. The platform integrates a SiC diffractive optical element (DOE) with a wafer scale 26 element SiC metalens array. The array consists of metalenses with a diameter of 1.15 cm and a numerical aperture (NA) of 0.5 and exhibits high uniformity across the array, with a 3σ focal length deviation of 10.73 μm, corresponding to 0.11% of the designed focal length, and an average image normalized focusing efficiency of 93.90%. This architecture converts a large aperture input beam into multiple focusing channels compatible with millimeter to centimeter scale industrial laser beams, with 4, 9, and 26 beam configurations fabricated and characterized. As the front end component exposed to the full incident beam before power division, the SiC DOE experiences the most stringent power handling condition in the architecture and exhibits a continuous wave laser induced damage threshold of 6.11 kW/cm 2 , confirming its suitability for high power beam splitting. These results establish a SiC meta-optic platform for robust high power multi-beam photonic systems and suggest a scalable route toward next generation parallel laser processing.
Abstract Femtosecond laser processing provides a versatile route for high-precision material structuring, yet the dynamic modulation of nanoscale feature sizes remains constrained by the far-field diffraction limit and insufficient control over local energy deposition. To overcome these limitations, we report a nanofabrication method based on binary pupil phase modulation of a radially polarized beam, introducing optical-field structural parameters as an active dimension for tuning the feature size of laser-processed structures. This method enables controllable modulation of single-pulse laser-processed features over a range of approximately 50–250 nm. Under an optimized phase state and energy window, this method further pushes the lower limit of size modulation to 14 nm (λ/57). Mechanistic analysis shows that this limiting size arises from the combined action of focal-field reshaping, tunnelling-ionization-dominated nonlinear material response, and threshold selection. We further extend this method to large-area nanopatterning, where the fabricated nanohole arrays and nanogratings can extend to the centimeter scale while maintaining feature sizes at the hundred-nanometer level. This method enables controllable modulation of laser-processed structures at the nanoscale and offers a route for next-generation programmable and highly controllable nanomanufacturing platforms.
Quantifying light–matter interactions is crucial for the design of nanophotonic devices, but remains challenging because excitation, recombination, photon extraction, and collection processes are strongly intertwined. Here, we developed a quantitative framework to decouple these processes by combining angle-resolved photoluminescence (PL), direct PL quantum yield (PLQY), PL lifetime measurements, and full-wave simulations. Our study focuses on large-area one-dimensional photonic crystals (PC) coupled with a thin film of CsPbI3 perovskite nanocrystals (NCs). By intentionally minimizing excitation enhancement through careful system design ( η_exc=1 and η_exc=1.15 for S- and P-polarizations, respectively), we assess emission-side processes as the dominant contributors to the experimentally observed PL enhancement. The system yields a 110‑fold in PL enhancement mediated by quasi-bound states in the continuum (quasi-BIC) while a tenfold enhancement is achieved via normal Bloch resonances, relative to the PL intensity on glass. Our quantitative decomposition reveals that the quasi-BIC enhancement is primarily driven by photon extraction (factor 21), far exceeding contributions from QY enhancement (factor of 1.94), and collection efficiency (factor of 3.25). In contrast, the enhancement associated with the Bloch resonances ( tenfold) arise from a more balanced interplay of extraction (factor of 2.71), QY enhancement (1.37) included Purcell-based emission rate enhancement (factor of 1.24), and improved collection efficiency (factor of 3.2). These findings uncover the interplay of concurrent processes and provide a quantitative validation of the reciprocal principle for designing resonant light-emitting surfaces. Our work establishes a broadly applicable framework for evaluating exciton-cavity interactions in lossy systems, enabling precise control of light emission for high-efficiency optoelectronic devices, quantum light sources, and advanced sensing technologies.
Abstract Metasurfaces are progressively reshaping traditional optical paradigms and pushing the boundaries in complex applications where compact designs are essential. However, the design of metasurfaces demands substantial computational resources to numerically solve Maxwell's equations—particularly for large-scale photonic systems. Conventional forward design using electromagnetic solvers is based on specific approximations that may not effectively address complex problems. In contrast, existing inverse design methods are a stepwise process that is often time-consuming. Here, we overcome these challenges by presenting MetaE-former architecture, a Neighborhood Attention Transformer-based transfer learning framework that enables customized surrogate solver development through fine-tuning of pre-trained neural networks with only thousands of data, facilitating highly efficient task-adaptable inverse design of metasurfaces. Moreover, this method achieves global solutions for hundreds of nanostructures simultaneously, providing up to a 250,000-fold speedup during the optimization stage compared with solving for individual meta-atoms based on the FDTD method. As examples, we demonstrate a binarized high-numerical-aperture (~ 1.31) metalens and several optimized structured-light meta-generators. Our method significantly improves the beam shaping adaptability with metasurfaces and paves the way for quick design of large-scale metadevices with high accuracy.
