The durability and functionality of orthopedic implants have significantly advanced modern medicine; however, they continue to face challenges due to biological and mechanical complications, e.g., inadequate osseointegration, microbial infections, wear-induced degradation, corrosion, and mechanical failure. Orthopedic implants are utilized to address various musculoskeletal disorders. Consequently, biomaterials are extensively studied for such applications to determine their performance, longevity, and biological interactions. We present a comprehensive analysis of plasma-assisted nanofunctionalization strategies for metals, polymers, and ceramics, elucidating how nanoscale surface engineering enhances the osseointegration, antibacterial and mechanical properties of these materials. Particularly, magnetron sputtering methods have emerged as promising solutions for augmenting the performance of implantable biomaterials. These techniques have been critically evaluated for their capacity to fine-tune the properties of thin films at the nanoscale, enhancing their mechanical strength, surface wettability, and biological response. Additionally, emphasis is given on improving surface characteristics, such as biocompatibility, antibacterial activity, corrosion/wear properties, and controlled drug or ion release through tailored coatings, including ion-substituted and nanostructured layers. Furthermore, the integration of nanostructured coatings and multifunctional nanoparticles is discussed in the context of biofilm inhibition, inflammation reduction, and the regenerative potential of these coatings. Also, the economic viability and translational aspects of plasma-coated implants are addressed.
Atomically precise bottom–up synthesis of one–dimensional (1D) inorganic nanomaterials is a frontier challenge, as their electronic and quantum properties are highly sensitive to width, edge structure, and chirality. Graphene nanoribbons and carbon nanotubes have achieved atomic precision through molecular design, but inorganic materials lack such programmability and intrinsically favour 3D growth, demanding fundamentally different strategies for 1D confinement. In this Review, we summarize recent breakthroughs in the atomically precise synthesis of inorganic 1D nanostructures, including nanotube‑confined atomic wires, transition metal dichalcogenide nanoribbons, single‑metal‑atom chains templated by grain boundaries in 2D crystals, and monoelemental systems. We organize the field into three paradigms: external template confinement, catalyst‑guided anisotropic growth, and internal defect templating. We compare these strategies with respect to their strengths and limitations in width control, edge quality, scalability, and integration potential. Finally, we outline the critical challenges in scalable fabrication, metrology, and integration with technological application. This review aims to offer an outlook on how atomically precise 1D nanomaterials could reshape the future of semiconductor devices beyond silicon.
This review examines hydrogenated amorphous carbon coatings with silicon and oxygen (a-C:H:SiOx), and focuses on synthesis methods, along with coatings structural characteristics, and multifunctional properties. The incorporation of silicon into diamond-like carbon matrix significantly reduces internal stress, enhances thermal stability and mechanical performance. Adding SiOx allows depositing thicker and better-adhered coatings. Various plasma-assisted chemical vapor deposition techniques, including direct current, radio frequency, hot filament plasma-enhanced chemical vapor deposition, and closed drift ion beam sources are evaluated for their effects on coatings morphology, phase composition, and functional behavior. Tribological properties of a-C:H:SiOx coatings with lower friction coefficient and reduced wear rate are discussed from the SiOx concentration and deposition parameters perspective. Anti-corrosion performance is substantially improved with SiOx concentration, attributed to decreased porosity and enhanced surface wear resistance. Optical studies demonstrate tunable refractive index and high transparency across the visible and infrared spectra. These properties make a-C:H:SiOx coatings promising candidates for protective and anti-reflective applications on various substrates, including stainless steel, silicon and germanium. This review highlights how the combined effects of SiOx concentration and deposition process optimization affect the properties and performance of a-C:H:SiOx coatings, advancing their applications in industrial, biomedical, and optical fields.
Synthetic diamond, prized for its exceptional thermal conductivity, is a leading candidate for thermal management. In practice, it is integrated with semiconductor or metal substrates to create efficient heat-dissipation pathways, making the thermal conductance of the bonding interface critical in modern electronics. In this review, recent advances in bonding technology and thermal conductance of synthetic diamond have been summarized and elucidated to reveal the underlying mechanisms that influence its interfacial thermal conductivity. Firstly, the structural and thermal properties of diamond are summarized; then, the applications of existing theoretical models for thermal conductance of synthetic diamond and other materials are discussed; thirdly, the interfacial microstructures between synthetic diamond and typical semiconductors such as Si, GaN, and β-Ga2O3 are examined in order to bridge the relationship between integration process and the interfacial thermal conductance of diamond-based components; finally, the formation of interfacial carbides on synthetic diamond has been reviewed in an attempt to achieve a deep understanding on the bonding microstructure and the interfacial thermal conductance of synthetic diamond. Thus, this review aims to link the integration processes, the interfacial microstructure, and interfacial thermal conductance, and hence point out the future directions and challenges in diamond interfacial thermal transport regulation.
Tin dioxide is a semiconductor, valued for its unique combination of electrical, optical, chemical, and magnetic properties, including superior electrochemical stability, durability, and high electrical conductivity. These attributes support a wide range of applications and have driven extensive research into the development of advanced SnO2-based materials. Among the various methods used to synthesize tin dioxide layers, electrodeposition has attracted particular attention due to its simplicity, cost-effectiveness, and scalability. However, to date, no comprehensive review has systematically examined the electrochemical deposition conditions of SnO2, which are reported in the literature in diverse and often inconsistent forms. Furthermore, a systematic analysis of the thermodynamic and kinetic principles underlying this process remains almost lacking. Accordingly, this review surveys recent advances in the electrodeposition of nanostructured tin dioxide and provides a critical, integrative analysis aimed at clarifying unresolved mechanistic issues and addressing longstanding challenges in the field. The first section outlines the fundamental principles governing SnO2 electrodeposition, with emphasis on the underlying mechanisms that remain incompletely understood. The next sections examine the influence of deposition parameters on the morphology, composition, and functional properties of the resulting oxide layers. The paper concludes with representative examples demonstrating the diverse applications of electrodeposited SnO2.
