A Novel Triple Patterning Lithography Layout Decomposition Algorithm with Clustering

Triple patterning lithography, is a practical method of layout manufacturing under advanced technology node. In triple patterning lithography, the most important thing is layout decomposition. In the process of layout decomposition, proper layout simplification can greatly improve the solving speed, but the simplification of these algorithms used in the industries now are not enough. In this paper, we proposed a new clustering algorithm to further reduce the scale of each conflict graph. Meanwhile, a new color adjustment algorithm between clusters are proposed to maintain or even reduce the decomposition cost. Experimental results show that the proposed algorithm with clustering can achieve an 11% decrease in decomposition cost, and a 26% improvement in solving speed compared with the algorithm without clustering, averagely.