Collimated Point-Source X-Ray Nanolithography

The most efficient use of radiation point sources for x-ray lithography requires a collimator to capture a large fraction of spherically emitted radiation and deliver the rays with acceptable divergence properties. We describe an x-ray point source utilizing a polycapillary collimator. The optical performance of the collimator was measured and is described. Dense line-space patterns (∼100 nm lines) were printed in poly(methylmethacrylate) using a mask-wafer gap of 16 μm. Lithography results are consistent with modeling analysis.