ControLayout: Conditional Diffusion for Style-Controllable and Violation-Fixable Layout Pattern Generation

Due to the lengthy design cycle, generating legal, diverse and valid layout patterns artificially to expand VLSI layout pattern libraries has become an important problem to solve in order to facilitate modern design-for-manufacturability (DFM) studies. Considering the more realistic demands and to enhance functionality, this work proposes a style-controllable and violation-fixable layout pattern generation framework based on conditional diffusion models named ControLayout, which treats pattern category and complexity as conditions to control the style of generated patterns, and leverages the idea of image masking-inpainting to fix violations adaptively. Experiments reveal its promising performance in controllability and different metrics compared with the state-of-the-art methods.