Effect of Methyl Group of Terminal Phenol of Dissolution Inhibitor on Sensitivity in Chemically Amplified Three-Component Novolac Resists
Katsuaki Takashima, Hidekazu Konishi, Yuichirou Tanaka,Hideo Horibe Journal of Photopolymer Science and Technology(2026)SCI 4区
Department of Chemistry and Bioengineering