The Electron String Ion Source (ESIS) is type of electron beam ion source working in a reflex mode under specific conditions [1]. The operation is based on step-by-step ionization of the ions by hitting with electrons of an electron string. ESIS is a complex facility and ion trap control system is its important part. It affects ion beam formation process and transfer to NICA HILAC. The version, which is under operation now is based on resistance divider. The new system is based on independent modules and could make operation process more flexible. The paper describes development of the ESIS ion trap control system electronics, its modifications and operation process.
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